Nb sputtering target

Nb sputtering target

.Material:  RO4200-1, RO4210-2

2.type :      rectangle, circular, tube target, plate target

3.Standard:  As per ASTM B392-98

4.Purity:        >=99.9%  or  99.95%

5. Grade: Nb1,Nb2

6 Characteristic:

    Melting Point: 2468°C

    Boiling Point :4742°C

    Density: 8.57g/cm3

7. Certificate: ISO9001

8. Product Feature: High melting point, High-density, high temperature oxidation resistance, long service life, resistance to corrosion..

Application :It's widely used in coating processing industries:

 

such as solar photovoltaic appication,semiconductor application, chip, precision electronic

Chemical composition  %
	Nb	Fe	Si		Ni	W	Mo	Ti	Ta	O	C	H	N
Nb1	Remainder	0.004	0.002		0.002	0.004	0.004	0.002	0.07	0.015	0.005	0.0015	0.003
Nb2	Remainder	0.02	0.02		0.005	0.02	0.02	0.005	0.15	0.03	0.01	0.0015	0.01

 

product, display screen and high-end optical materials.